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Plasma-enhanced Chemical Vapor Deposition and Characterization of Tungsten Films
Language: en
Pages: 270

Plasma-enhanced Chemical Vapor Deposition and Characterization of Tungsten Films

Authors: John Ka-ngai Chu
Categories: Dissertations, Academic
Type: BOOK - Published: 1982 - Publisher:

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Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films
Language: en
Pages:

Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films

Authors: Kevin John Grannen
Categories:
Type: BOOK - Published: 1994 - Publisher:

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Programmed Rate Chemical Vapor Deposition
Language: en
Pages: 246

Programmed Rate Chemical Vapor Deposition

Authors: Kathryn M. Tracy
Categories: Chemical vapor deposition
Type: BOOK - Published: 1996 - Publisher:

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Chemical Vapor Deposition and Characterization of Tungsten Boron Alloy Films
Language: en
Pages: 8

Chemical Vapor Deposition and Characterization of Tungsten Boron Alloy Films

Authors:
Categories:
Type: BOOK - Published: 1993 - Publisher:

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A low pressure chemical vapor deposition (LPCVD) process for depositing W{sub X}B{sub (1-X)} films from WF6 and B2H6 is described. The depositions were performe
Deposition and Characterization of Blanket Tungsten Films Using Atmospheric Pressure Chemical Vapor Deposition
Language: en
Pages: 224

Deposition and Characterization of Blanket Tungsten Films Using Atmospheric Pressure Chemical Vapor Deposition

Authors: Uday Vinod Patel
Categories: Chemical vapor deposition
Type: BOOK - Published: 1994 - Publisher:

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