Today, plasma-enhanced chemical vapor deposition (PECVD) remains the dominant processing method for the manufacture of silicon thin films due to inexpensive pro
Facilitated by the increasing importance and demand of semiconductors for the smartphoneand even the automobile industry, thermal atomic layer deposition (ALD)
The proceedings from Parallel CFD 2006 covers all aspects of parallel computings and its applications. Although CFD is one of basic tools for design procedures
This book collects the proceedings of the Parallel Computational Fluid Dynamics 2008 conference held in Lyon, France. Contributed papers by over 40 researchers