Download or read book Advanced Fabrication and Characterization of Quantum and Nanophotonic Devices and Systems written by and published by . This book was released on 2004 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The program completed its acquisition of equipment for the Micro- Fabrication Facility. The facility is used for fabrication of Quantum and Nanophotonic devices and consists of a CAIBE system capable of sub- micron resolution anisotropic (i.e. high aspect-ratio) etching and a RIE refurbished by INTELVAC Inc. A major capability is a facility for near field complex amplitude characterization with nanoscale spatial and femtosecond scale time resolution for nanophotonics applications. This facility was designed and built in house. The necessary equipment and components to construct the sub-systems have been integrated into the system and are summarized below: (1)Femtosecond MIRA OPO, Coherent Inc., and b) Near Field Scanning Optical Microscope (NSOM), TS2000 Nanonics Imaging Ltd. The total cost of the acquired equipment for fabrication and Characterization of Quantum and Nanophotonic Devices and Systems was $260,000. The acquired equipment during the reporting period was used to support needs of nanofabrication and characterization of several projects at UCSD: (I) "Quantum device technologies - applying 2-D photonic crystals," (Y. Fainman, L.J. Sham, C. Tu) supported by AFOSR and DARPA's Quantum Information Science and Technology Programs; (2) " Artificial Dielectrics and Photonic Crystals for STAB Elements: the Receiver" (Y. Fainman) supported by DARPA/STAB Program SPAWAR/DARPA #N66001-00-C-80'75; and (3) "Optical Nonlinearities Enhanced by Near-field Diffraction in Artificial Dielectric Nanostructures."