Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
| Author | : John E.J. Schmitz |
| Publisher | : William Andrew |
| Total Pages | : 264 |
| Release | : 1992-12-31 |
| ISBN-10 | : UOM:39015024969662 |
| ISBN-13 | : |
| Rating | : 4/5 (62 Downloads) |
Book Synopsis Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications by : John E.J. Schmitz
Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.
