Download or read book Large-Area Nanoimprint Lithography and Applications written by Hongbo Lan and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Large-area nanoimprint lithography (NIL) has been regarded as one of the most promising micro/nano-manufacturing technologies for mass production of large-area micro/nanoscale patterns and complex 3D structures and high aspect ratio features with low cost, high throughput, and high resolution. That opens the door and paves the way for many commercial applications not previously conceptualized or economically feasible. Great progresses in large-area nanoimprint lithography have been achieved in recent years. This chapter mainly presents a comprehensive review of recent advances in large-area NIL processes. Some promising solutions of large-area NIL and emerging methods, which can implement mass production of micro-and nanostructures over large areas on various substrates or surfaces, are described in detail. Moreover, numerous industrial-level applications and innovative products based on large-area NIL are also demonstrated. Finally, prospects, challenges, and future directions for industrial scale large-area NIL are addressed. An infrastructure of large-area nanoimprint lithography is proposed. In addition, some recent progresses and research activities in large-area NIL suitable for high volume manufacturing environments from our Labs are also introduced. This chapter may provide a reference and direction for the further explorations and studies of large-area micro/nanopatterning technologies.