Source Issues Relevant to X-Ray Lithography
Author | : Khanh Nguyen |
Publisher | : |
Total Pages | : 6 |
Release | : 1992 |
ISBN-10 | : OCLC:228023927 |
ISBN-13 | : |
Rating | : 4/5 (27 Downloads) |
Download or read book Source Issues Relevant to X-Ray Lithography written by Khanh Nguyen and published by . This book was released on 1992 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: Considerations of the various issues relating to radiation sources for x-ray lithography are presented, focusing on two leading candidates-laser-produced plasma and synchrotron radiation sources. Issues to be addressed include power requirements of an x-ray source, deliverable power to wafer for both synchrotrons and laser plasma sources, and the requirement for collection solid angle and conversion efficiency for laser plasma sources. In our analysis, we attempt to bring out the relative merits of the sources and the advances necessary to make them viable for future x-ray lithographic systems.